The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers. Compatible with inert gases; Flange sizes: 25 and 40; Operating pressure range: Atmospheric to 0.01 Pa; Operating temperature: 5-40°C; Voltage options: (100, 110, 200, 220, 230, 240)VAC; (12, 24)VDC

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers. Light weight and compact; Uniform baking temperature; High fluorine resistance; Low outgassing; Little heavy metal contamination

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers. Light weight and compact; Uniform baking temperature; High fluorine resistance; Low outgassing; Little heavy metal contamination

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers. High vacuum angle valve; Type: manual, bellows seal; Flange size: 16 ~ 50; Heater type: H1 (80°C), H2 (100°C), H3 (120°C); Auto switches not available

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers. XLF is a normally closed, single acting high vacuum angle valve with an O-ring shaft seal.  The XL*-2 family shares common features with all series members. 

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

Actuation control pressure isolated from process gas by two seals; Body material: 316L SS secondary remelt; High inlet pressure type: Max. 3500 psig (24.1 MPa); Flow capacity: Standard to 30 slpm, HF (Option) to 120 slpm; Ni-Cr-Mo alloy internals available for corrosion resistance; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or less

Actuation control pressure isolated from process gas by two seals ; Body material: 316L SS secondary remelt ; High inlet pressure type: Max. 3500 psig (24.1 MPa) ; Flow capacity: Standard to 30 slpm ; Ni-Cr-Mo alloy internals available for corrosion resistance ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or less

Actuation control pressure isolated from process gas by two seals ; Body material: 316L SS secondary remelt ; High inlet pressure type:  Standard Max. 2300 psig (15.9 MPa); HR Max. 3000 psig (20.7 MPa  ; Flow capacity: Standard to 400 slpm ; Ni-Cr-Mo alloy internals standard ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or less

Actuation control pressure isolated from process gas by two seals ; Body material: 316L SS secondary remelt ; High inlet pressure type: Standard Max. 1700 psig (11.7 MPa); HR Max. 3000 psig (20.7 MPa ; Flow capacity: Standard to 800 slpm ; Ni-Cr-Mo alloy internals available for corrosion resistance ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or

Actuation control pressure isolated from process gas by two seals ; Body material: 316L SS ; High inlet pressure type: Standard Max. 3500 psig (24.1 MPa) ; Flow capacity: Standard to 30 slpm; HF to 120 slpm  ; Ni-Cr-Mo alloy internals available for corrosion resistance ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or less

Actuation control pressure isolated from process gas by two seals ; Body material: 316L SS secondary remelt ; High inlet pressure type: Standard Max. 3500 psig (24.1 MPa) ; Flow capacity: Standard to 30 slpm ; Ni-Cr-Mo alloy internals available for corrosion resistance ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or less

Actuation control pressure isolated from process gas by two seals ; Body material: 316L SS secondary remelt ; High inlet pressure type: Standard Max. 2300 psig (15.9 MPa); HR: Max. 3000 psig (20.7MPa) ; Flow capacity: Standard to 400 slpm ; Ni-Cr-Mo alloy internals available for corrosion resistance ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure