Please contact us for the latest version.sales@ocaire.com, VALVE, DBL SOL, BASE MT (AC), VALVE, SY3000 SOL/VALVE, RUBBER SEAL, NI, SY BASE MT 1/8, .33069 lb

Please contact us for the latest version.sales@ocaire.com, VALVE DBL NON PLUGIN BASE MT, VALVE, VFR2000 SOL VALVE 4/5 PORT, NI, VFR2000 BASE MT 1/8, .94798 lb, Type of actuationModelPort size RcFlow characteristics (1)(2)Max. operating cycle (Hz)(3)Response time (ms)(4)Mass (kg) Plug-inNon plug-in1 4/2 (P A/B)4/2 5/3 (A/B EA/EB) C[dm3/(s?bar)]bCvC[dm3/(s?

Please contact us for the latest version.sales@ocaire.com, VALVE, AIR PILOT, BASE MT, VALVE, SY3000 SOL/VALVE, RUBBER SEAL, NI, SY BASE MT 1/8, .16957 lb

Please contact us for the latest version.sales@ocaire.com, VALVE DBL NON PLUG-IN BASE MT, VALVE, VFS2000 SOL VALVE 4/5 PORT, NI, VFS2000 BASE MT 1/8, 1.17579 lb

Please contact us for the latest version.sales@ocaire.com, VALVE, BASE MOUNT, DIN (DC), VALVE, VQZ2000 VALVE, SOL 4/5-PORT, NI, VQZ2000 BASE MNT 1/8, .66354 lb

.: 08 (ø8), Seal Method: S (With Sealant), Option: D (General Environment, Brass Parts, Ni Plating)

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers. Light weight and compact; Uniform baking temperature; High fluorine resistance; Low outgassing; Little heavy metal contamination

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers. High vacuum angle valve; Type: manual, bellows seal; Flange size: 16 ~ 50; Heater type: H1 (80°C), H2 (100°C), H3 (120°C); Auto switches not available

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers. Light weight and compact; Uniform baking temperature; High fluorine resistance; Low outgassing; Little heavy metal contamination

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers. Compatible with inert gases; Flange sizes: 25 and 40; Operating pressure range: Atmospheric to 0.01 Pa; Operating temperature: 5-40°C; Voltage options: (100, 110, 200, 220, 230, 240)VAC; (12, 24)VDC

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers. Light weight and compact; Uniform baking temperature; High fluorine resistance; Low outgassing; Little heavy metal contamination

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers. Light weight and compact; Uniform baking temperature; High fluorine resistance; Low outgassing; Little heavy metal contamination

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers. High vacuum angle valve; Type: manual, bellows seal; Flange size: 16 ~ 50; Heater type: H1 (80°C), H2 (100°C), H3 (120°C); Auto switches not available

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers. XLF is a normally closed, single acting high vacuum angle valve with an O-ring shaft seal.  The XL*-2 family shares common features with all series members. 

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.