Actuation control pressure isolated from process gas by two seals; Body material: 316L SS secondary remelt; High inlet pressure type: Max. 3500 psig (24.1 MPa); Flow capacity: Standard to 30 slpm, HF (Option) to 120 slpm; Ni-Cr-Mo alloy internals available for corrosion resistance; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or less

Actuation control pressure isolated from process gas by two seals ; Body material: 316L SS secondary remelt ; High inlet pressure type: Max. 3500 psig (24.1 MPa) ; Flow capacity: Standard to 30 slpm ; Ni-Cr-Mo alloy internals available for corrosion resistance ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or less

Actuation control pressure isolated from process gas by two seals ; Body material: 316L SS secondary remelt ; High inlet pressure type:  Standard Max. 2300 psig (15.9 MPa); HR Max. 3000 psig (20.7 MPa  ; Flow capacity: Standard to 400 slpm ; Ni-Cr-Mo alloy internals standard ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or less

Actuation control pressure isolated from process gas by two seals ; Body material: 316L SS secondary remelt ; High inlet pressure type: Standard Max. 1700 psig (11.7 MPa); HR Max. 3000 psig (20.7 MPa ; Flow capacity: Standard to 800 slpm ; Ni-Cr-Mo alloy internals available for corrosion resistance ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or

Actuation control pressure isolated from process gas by two seals ; Body material: 316L SS ; High inlet pressure type: Standard Max. 3500 psig (24.1 MPa) ; Flow capacity: Standard to 30 slpm; HF to 120 slpm  ; Ni-Cr-Mo alloy internals available for corrosion resistance ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or less

Actuation control pressure isolated from process gas by two seals ; Body material: 316L SS secondary remelt ; High inlet pressure type: Standard Max. 3500 psig (24.1 MPa) ; Flow capacity: Standard to 30 slpm ; Ni-Cr-Mo alloy internals available for corrosion resistance ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or less

Actuation control pressure isolated from process gas by two seals ; Body material: 316L SS secondary remelt ; High inlet pressure type: Standard Max. 2300 psig (15.9 MPa); HR: Max. 3000 psig (20.7MPa) ; Flow capacity: Standard to 400 slpm ; Ni-Cr-Mo alloy internals available for corrosion resistance ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure

Actuation control pressure isolated from process gas by two seals ; Body material: 316L SS ; High inlet pressure type: Standard Max. 1700 psig (11.7 MPa); HR: Max. 3000 psig (20.7MPa) ; Flow capacity: Standard to 800 slpm; HF (Option) to 1000 slpm  ; Ni-Cr-Mo alloy internals available for corrosion resistance ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control

Actuation control pressure isolated from process gas by two seals ; Body material: 316 SS ; High inlet pressure type: Standard Max. 3500 psig (24.1 MPa) ; Flow capacity: Standard to 30 slpm; HF (Option) to 120 slpm ; Ni-Cr-Mo alloy internals available for corrosion resistance ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or less

Actuation control pressure isolated from process gas by two seals ; Body material: 316 SS ; High inlet pressure type: Standard Max. 3500 psig (24.1 MPa) ; Flow capacity: Standard to 30 slpm ; Ni-Cr-Mo alloy internals available for corrosion resistance ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or less

Actuation control pressure isolated from process gas by two seals ; Body material: 316 SS ; High inlet pressure type: Standard Max. 2300 psig (15.9 MPa); HR (Option): Max. 3000 psig (20.7 MPa) ; Flow capacity: Standard to 400 slpm ; Ni-Cr-Mo alloy internals ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or less

Actuation control pressure isolated from process gas by two seals ; Body material: 316 SS ; High inlet pressure type: Standard Max. 1700 psig (11.7 MPa) ; Flow capacity: Standard to 800 slpm; HF (Option) to 1000 slpm ; Ni-Cr-Mo alloy internals available for corrosion resistance ; 100 psig (0.69 MPa) outlet pressure achievable with 80 psig (0.55 MPa) control pressure or less

Double acting, wedge cam; High repeatability: ±0.01 mm; Bore sizes (mm): 16, 20, 25, 32; Dust cover: chloroprene rubber (CR), fluororubber (FKM), silicone rubber (Si); Series 25A-MHSJ3 is compatible with secondary battery applications

Double acting, wedge cam; High repeatability: ±0.01 mm; Bore sizes: 16, 20, 25, 32, 40, 50, 63, 80 mm ; Dust cover: chloroprene rubber (CR), fluororubber (FKM), silicone rubber (Si); Option for NSF-H1, food grade lubricant

Double acting, wedge cam; High repeatability: ±0.01 mm; Bore sizes: 16, 20, 25, 32, 40, 50, 63, 80 mm ; Dust cover: chloroprene rubber (CR), fluororubber (FKM), silicone rubber (Si); Option for NSF-H1, food grade lubricant

Body Size: 20, Thread: N (NPT), Port Size: 02 (1/4), Option: BC (B + C), Semi-Standard 1: CR (C + R), Semi-Standard 2: Z (Name Plate, Caution Plate for Bowl, & Pressure Gauge in Imperial Units: psi, °F)

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers. Light weight and compact; Uniform baking temperature; High fluorine resistance; Low outgassing; Little heavy metal contamination

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers. Light weight and compact; Uniform baking temperature; High fluorine resistance; Low outgassing; Little heavy metal contamination

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.

The valve does not contain heavy metals such as Ni (nickel) or Cr (chrome) and a low sputtering yield also helps to minimize heavy metal contamination of semiconductor wafers.